Christof Roscher

Title: Christof Roscher: Innovator in Silicon Dioxide Dispersion Technology

Introduction

Christof Roscher is a notable inventor based in Hamburg, Germany. He has made significant contributions to the field of materials science, particularly in the development of silicon dioxide dispersions. His innovative work has implications for various applications in polymer materials.

Latest Patents

Christof Roscher holds 1 patent for his invention titled "Silicon Dioxide Dispersion." This invention relates to a silicon dioxide dispersion that comprises an outer flowable phase containing polymerizable monomers, oligomers, and/or prepolymers that can be converted to polymers by non-radical reaction, and a disperse phase containing amorphous silicon dioxide. The dispersion is characterized by an average particle size of the silicon dioxide, measured by small angle neutron scattering (SANS), ranging between 3 and 50 nm, with a maximum half-width of the distribution curve of 1.5 d. This innovative dispersion can be easily manufactured even at higher concentrations of the disperse phase and can be used to produce polymer materials with advantageous mechanical properties.

Career Highlights

Christof Roscher is currently associated with Evonik Hanse GmbH, where he continues to advance his research and development efforts. His work focuses on enhancing the properties of materials through innovative dispersion techniques.

Collaborations

He collaborates with esteemed colleagues such as Johannes Adam and Christian Eger, contributing to a dynamic research environment that fosters innovation and development in material sciences.

Conclusion

Christof Roscher's contributions to silicon dioxide dispersion technology exemplify the impact of innovative thinking in materials science. His work not only advances the field but also opens new avenues for the development of high-performance polymer materials.