Company Filing History:
Years Active: 1984
Title: Christine Brandeis: Innovator in Reactive Ion Etching Technology
Introduction
Christine Brandeis is a notable inventor based in Sindelfingen, Germany. She has made significant contributions to the field of reactive ion etching, a crucial process in semiconductor manufacturing. With a focus on enhancing etching methods, her work has implications for various technological advancements.
Latest Patents
Christine Brandeis holds a patent for a "Reactor for Reactive Ion Etching and Etching Method." This innovative reactor features a plate-shaped cathode that is horizontally arranged and connected to an alternating voltage within a grounded casing. The design includes gas inlet and outlet lines, and the cathode is equipped with means for generating local magnetic fields that are restricted to the region of the individually supported substrates. The reactor allows for the etching of substrates using plasma produced from at least one reactive gas, ensuring each substrate is exposed to at least one local magnetic field. This technology enables a controlled etching speed ratio, particularly when etching materials with varying chemical and physical properties.
Career Highlights
Christine Brandeis has had a distinguished career at IBM, where she has been instrumental in advancing etching technologies. Her innovative approach and dedication to research have positioned her as a key figure in her field. With a total of 1 patent, her contributions continue to influence the semiconductor industry.
Collaborations
Christine has collaborated with esteemed colleagues such as Jurgen Kempf and Georg Kraus. Their combined expertise has fostered a productive environment for innovation and development in reactive ion etching technologies.
Conclusion
Christine Brandeis exemplifies the spirit of innovation in the field of reactive ion etching. Her work at IBM and her patented technology contribute significantly to advancements in semiconductor manufacturing. Her dedication to research and collaboration with fellow experts highlights the importance of teamwork in driving technological progress.