Company Filing History:
Years Active: 2025
Title: Christina M Chang: Innovator in Copper Halide Layer Technology
Introduction
Christina M Chang is a prominent inventor based in Cambridge, MA (US). She has made significant contributions to the field of materials science, particularly in the development of copper halide layers. Her innovative work has led to the filing of a patent that showcases her expertise and creativity in this area.
Latest Patents
Christina holds a patent for her invention related to copper halide layers. The patent describes articles that include a substrate and a copper halide layer on the substrate. The interfacial free energy between the substrate and the copper halide layer allows the copper halide layer to form continuously, conforming to the shape of the substrate. Additionally, the articles may include an adhesion layer positioned between the substrate and the copper halide layer. The surface free energy between the adhesion layer and the copper halide layer also facilitates continuous formation, ensuring that either the copper halide layer or the adhesion layer conforms to the substrate's shape. The patent further details methods of forming an article using chemical vapor deposition.
Career Highlights
Christina is affiliated with Harvard College, where she continues to advance her research and innovation in materials science. Her work has garnered attention for its potential applications in various industries, including electronics and photonics.
Collaborations
Christina has collaborated with notable colleagues, including Luke M Davis and Roy Gerald Gordon. These partnerships have contributed to her research and the development of her patented technologies.
Conclusion
Christina M Chang is a trailblazer in the field of copper halide layer technology, with a patent that highlights her innovative approach to materials science. Her contributions are paving the way for future advancements in this area.