Company Filing History:
Years Active: 2012
Title: Christian Holfeld: Innovator in EUV Mask Technology
Introduction
Christian Holfeld is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of photolithography, particularly in the development of extreme ultraviolet (EUV) mask technology. His innovative work has implications for the semiconductor manufacturing industry, where precision and accuracy are paramount.
Latest Patents
Holfeld holds a patent for an EUV mask and a method for repairing an EUV mask. The patent describes an EUV mask that comprises a substrate, a reflective multilayer on the substrate, and a phase-shifting material disposed above the multilayer in specific portions of the substrate. Additionally, the patent outlines a method for repairing an EUV mask that includes determining the position of a defect area and depositing a phase-shifting material to correct the exposure radiation affected by the defect.
Career Highlights
Christian Holfeld is associated with Advanced Mask Technology Center GmbH & Co. KG, where he has been instrumental in advancing EUV mask technology. His work focuses on enhancing the reliability and performance of masks used in semiconductor fabrication, which is critical for producing smaller and more efficient electronic devices.
Collaborations
Due to space constraints, the details of Holfeld's collaborations will not be included.
Conclusion
Christian Holfeld's contributions to EUV mask technology exemplify the innovative spirit necessary for advancements in the semiconductor industry. His patent and work at Advanced Mask Technology Center GmbH & Co. KG highlight the importance of precision in modern manufacturing processes.