Christian Buergel

Title: The Innovative Mind of Christian Buergel

Introduction

Christian Buergel, a notable inventor located in Langebrück, Germany, has made significant contributions to the field of circuit design and reticle fabrication. With one patent to his name, Buergel is recognized for his innovative approaches in addressing complex problems in semiconductor manufacturing.

Latest Patents

Christian Buergel holds a patent titled "Pattern classification based proximity corrections for reticle fabrication." This invention offers a method for enhancing the accuracy of reticle formations used in circuit design. The patent details a process whereby a digital layout of a circuit is paired with proximity compensation data derived from measurements of reticle elements. This data includes various proximity correction values aimed at mitigating the proximity effects encountered during the reticle-formation process. By applying these corrections based on pattern classification, the efficiency and precision of the circuit design fabrication process are substantially improved.

Career Highlights

Currently, Buergel is employed at Globalfoundries Singapore Pte. Ltd., where he leverages his expertise in semiconductor technologies. His role involves collaborating on cutting-edge research and development aimed at advancing fabrication techniques and enhancing the overall quality of circuit designs. His work reflects a commitment to innovation and excellence in a competitive industry.

Collaborations

Throughout his career, Christian Buergel has worked alongside esteemed colleagues, including Guoxiang Ning and Chin Teong Lim. These collaborations have enabled the sharing of knowledge and expertise, fostering an environment where innovative ideas can flourish. Together, they contribute to various projects that push the boundaries of what is possible in circuit design and manufacturing.

Conclusion

Christian Buergel stands out as a dedicated inventor in the realm of semiconductor fabrication. His patent regarding proximity corrections for reticle fabrication not only showcases his technical acumen but also demonstrates his commitment to improving practices in the industry. As he continues to collaborate with fellow innovators, the future holds great promise for further advancements stemming from his contributions.