Grand Rapids, MI, United States of America

Chris Taylor

USPTO Granted Patents = 2 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):Explore Patents

Title: Chris Taylor: Innovator in Space and Geometry Modeling

Introduction

Chris Taylor is a notable inventor based in Grand Rapids, MI (US). He has made significant contributions to the fields of space and geometry modeling through his innovative patents. With a total of 2 patents, Taylor's work focuses on utilizing machine learning systems to enhance design processes.

Latest Patents

Taylor's latest patents include "Generating space models and geometry models using a machine learning system with multi-platform interfaces." This patent addresses the export and translation of space models, allowing a computing platform to receive data indicating a request to export a space model to a design tool. The platform generates drawing files based on the space model by selecting a data format, extracting format-specific data, and creating the drawing files accordingly. Another patent, also titled "Generating space models and geometry models using a machine learning system with multi-platform interfaces," focuses on geometry model generation. It involves training a machine learning engine based on a plurality of drawing models and design parameters, resulting in the production of at least one geometry model.

Career Highlights

Chris Taylor is currently employed at Herman Miller, Inc., where he applies his expertise in machine learning and design. His innovative approach has positioned him as a key player in the development of advanced modeling techniques.

Collaborations

Some of his notable coworkers include Dudley E Whitney and James L Van Dragt, who contribute to the collaborative environment at Herman Miller, Inc.

Conclusion

Chris Taylor's work in space and geometry modeling showcases his innovative spirit and dedication to advancing design technologies. His contributions through patents reflect a commitment to improving the efficiency and effectiveness of design processes.

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