Company Filing History:
Years Active: 2007-2008
Title: Chris Harbinson: Innovator in Lithography Solutions
Introduction
Chris Harbinson is a notable inventor based in Raleigh, NC (US). He has made significant contributions to the field of lithography, particularly in the development of innovative solutions for chemically amplified photoresists. With a total of 2 patents to his name, Harbinson continues to push the boundaries of technology in his field.
Latest Patents
One of Harbinson's latest patents focuses on low pH development solutions for chemically amplified photoresists. This method for carrying out positive tone lithography with a carbon dioxide development system involves several steps. First, a substrate is provided, which has a polymer resist layer formed on it. Next, at least one portion of the polymer resist layer is exposed to radiant energy, causing a chemical shift in the exposed portion. This process creates at least one light field region in the polymer resist layer while maintaining at least one unexposed portion, forming a dark field region. The method may also include an optional baking step for the polymer resist layer. Finally, the polymer resist layer is contacted with a carbon dioxide solvent system, which comprises a polar group. This system is designed to preferentially remove the light field region from the substrate compared to the dark field region, utilizing a two-phase solvent system consisting of carbon dioxide and a polar fluid.
Career Highlights
Chris Harbinson is currently employed at Micell Technologies, Inc., where he applies his expertise in lithography and photoresist technology. His work has been instrumental in advancing the capabilities of photoresist applications in various industries.
Collaborations
Some of Harbinson's coworkers include Mark Wagner and Merrick Miles, who contribute to the innovative environment at Micell Technologies, Inc.
Conclusion
Chris Harbinson is a dedicated inventor whose work in lithography solutions has made a significant impact in the field. His innovative patents and contributions continue to shape the future of chemically amplified photoresists.