Company Filing History:
Years Active: 2025
Title: Innovations in Personal Protective Equipment by Choll Wan Kim
Introduction
Choll Wan Kim is an innovative inventor based in San Diego, California. He has made significant contributions to the field of personal protective equipment, focusing on enhancing user comfort and functionality. His work addresses critical issues faced by wearers of facial protective gear.
Latest Patents
Choll Wan Kim holds a patent for improved personal protective equipment facial wear. This invention includes an at least partly adhesive mask and one or more adhesive eye shields. The design aims to avoid significant contact with the delicate periorbital skin of the wearer while providing a substantially airtight seal. This feature helps to prevent moisture vapor transfer and fogging of eyewear or instruments. Additionally, the eye shield adheres partially overlapping with the mask, creating a seal around its perimeter. The mask and eye shield also prevent nasal airflow obstruction and address skin irritation during normal facial expressions and movements.
Career Highlights
Choll Wan Kim is associated with Mdideafactory, Inc., where he continues to develop innovative solutions in personal protective equipment. His work is characterized by a commitment to improving safety and comfort for users in various environments.
Collaborations
Choll Wan Kim collaborates with notable colleagues, including Michael J. O'Leary and Daniel Joseph Braun. Their combined expertise contributes to the advancement of personal protective technologies.
Conclusion
Choll Wan Kim's contributions to personal protective equipment demonstrate his dedication to innovation and user safety. His patented designs reflect a thoughtful approach to addressing common challenges faced by wearers.