Location History:
- Johor, MY (2001)
- Joher, MY (2001)
Company Filing History:
3 out of 832,880 Years Active: 2001
Title: Choi Pheng Soo: Innovator in Semiconductor Technology
Introduction
Choi Pheng Soo is a notable inventor based in Johor, Malaysia. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His innovative approaches have paved the way for advancements in manufacturing processes.
Latest Patents
Choi's latest patents include a simplified dual damascene process utilizing Plasma Polymerized Methylsilane Oxide (PPMSO) as an insulator layer. This process employs a single photo mask to define the metal trench and via region, effectively blocking UV light in the trench and via area to form PPMSO in the exposed regions. A two-step RIE plasma treatment using chlorine and oxygen gases removes the PPMS in the trench and via regions, followed by the deposition of conductive metal. A CMP process then polishes back both excess metal and PPMSO at a similar rate, resulting in conducting metal lines, interconnects, and via contacts without metal dishing.
Another significant patent involves the formation of air gap structures for inter-metal dielectric applications. This method includes creating a metal pattern of lines, depositing a layer of PPMS resist on top, and subjecting the surface to selective exposure. The unexposed PPMS is then removed, completing the process by closing up the openings within the PPMS.
Career Highlights
Choi Pheng Soo has established himself as a key figure in his field through his innovative patents and contributions to semiconductor technology. His work has been instrumental in enhancing manufacturing processes and improving the efficiency of semiconductor devices.
Collaborations
Choi has collaborated with notable coworkers, including Lap Chan and Wye Boon Loh, who have contributed to his projects and innovations.
Conclusion
Choi Pheng Soo's contributions to semiconductor technology through his patents demonstrate his innovative spirit and commitment to advancing the field. His work continues to influence the industry and inspire future innovations.