Company Filing History:
Years Active: 2005-2006
Title: Ching-Yueh Hu: Innovator in Dielectric Layer Technology
Introduction
Ching-Yueh Hu is a notable inventor based in Sunnyvale, CA, who has made significant contributions to the field of dielectric layer technology. With a total of 2 patents, Hu's work focuses on enhancing the performance and reliability of intermetal dielectric layers in electronic devices.
Latest Patents
One of Hu's latest patents is titled "Control of air gap position in a dielectric layer." This innovative method involves controlling the position of air gaps in intermetal dielectric layers between conductive lines. The process begins with the deposition of a first dielectric layer over at least two features and a substrate, creating an air gap between the features above their height. The first dielectric layer is then etched to open the air gap, followed by the deposition of a second dielectric layer, which forms an air gap completely below the feature height.
Career Highlights
Throughout his career, Ching-Yueh Hu has worked with several prominent companies, including Mosel Vitelic Corporation and Promos Technology, Inc. His experience in these organizations has allowed him to refine his skills and contribute to advancements in technology.
Collaborations
Hu has collaborated with talented individuals such as Tai-Peng Lee and Chuck Jang, further enhancing his innovative capabilities and expanding his professional network.
Conclusion
Ching-Yueh Hu's contributions to dielectric layer technology and his innovative patents demonstrate his commitment to advancing the field. His work continues to influence the development of electronic devices, showcasing the importance of innovation in technology.