Company Filing History:
Years Active: 2014
Title: Ching-Mei Wang: Innovator in Oxide Thin Film Technology
Introduction
Ching-Mei Wang is a prominent inventor based in Tainan, Taiwan. She has made significant contributions to the field of materials science, particularly in the manufacturing of oxide thin films. Her innovative approach has led to the development of a patented method that enhances the efficiency and quality of oxide thin film production.
Latest Patents
Ching-Mei Wang holds a patent for a "Method for manufacturing an oxide thin film." This method involves providing a coating material composed of a first precursor material, a fuel material, and a solvent. The process includes coating the material on a substrate and subsequently annealing it to convert the coated material into an oxide thin film. This innovation is crucial for various applications in electronics and optoelectronics.
Career Highlights
Ching-Mei Wang is affiliated with National Cheng-Kung University, where she continues to advance her research in materials science. Her work has garnered attention for its practical applications and potential to improve manufacturing processes in the semiconductor industry.
Collaborations
Ching-Mei Wang collaborates with esteemed colleagues, including Jih-Jen Wu and Wei-Ting Wu. These partnerships enhance her research capabilities and contribute to the advancement of innovative technologies in her field.
Conclusion
Ching-Mei Wang is a trailblazer in the development of oxide thin film technology. Her patented method represents a significant advancement in materials science, showcasing her dedication to innovation and research.