Company Filing History:
Years Active: 2025
Title: Innovations of Ching-Hua Kao
Introduction
Ching-Hua Kao is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of reactive ion etching, which is crucial in various manufacturing processes, particularly in semiconductor fabrication.
Latest Patents
Kao holds a patent for a "Method for Reactive Ion Etching." This innovative method involves placing a film in a vacuum chamber, introducing an etching gas, and performing reactive ion etching for a specified duration. The process includes stopping the etching and extracting the remaining gas to achieve a high-clean state with a pressure below 0.1 Pa. These steps are repeated until a predetermined etching depth is reached. This patent showcases his expertise and commitment to advancing technology in his field. He has 1 patent to his name.
Career Highlights
Ching-Hua Kao is affiliated with National Cheng Kung University, where he contributes to research and development in his area of expertise. His work has been instrumental in enhancing the efficiency and effectiveness of etching processes used in various applications.
Collaborations
Kao has collaborated with several esteemed colleagues, including Tse-Ming Chen and Chiu-Hua Huang, who is a prominent female researcher in the field. Their combined efforts have led to advancements in technology and innovation.
Conclusion
Ching-Hua Kao's contributions to the field of reactive ion etching exemplify his dedication to innovation and research. His patent and collaborations highlight the importance of teamwork in achieving technological advancements.