Company Filing History:
Years Active: 2009
Title: Innovations of Chin-Mu Lee in UV-Resistant Resin Compositions
Introduction
Chin-Mu Lee is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of resin compositions, particularly in developing materials that offer UV resistance. His innovative work is recognized for its potential applications in various industries.
Latest Patents
Chin-Mu Lee holds a patent for a resin composition capable of absorbing UV light. This invention comprises inorganic particulates and a resin that contains an acrylate monomer as a polymerized unit. The composition can be formulated into a coating for substrates, imparting UV resistance and excellent weatherability to the coated materials.
Career Highlights
Chin-Mu Lee is associated with Eternal Chemical Co., Ltd., where he continues to advance his research and development efforts. His work has positioned him as a key figure in the innovation of resin technologies.
Collaborations
Chin-Mu Lee collaborates with talented coworkers, including Tu-Yi Wu and Lung-Lin Hsu. Their combined expertise contributes to the success of their projects and the advancement of their field.
Conclusion
Chin-Mu Lee's contributions to resin compositions highlight his innovative spirit and dedication to improving material properties. His work in developing UV-resistant coatings showcases the importance of research in enhancing product performance.