Mount Sinai, NY, United States of America

Chin-Hung Jwo


Average Co-Inventor Count = 2.9

ph-index = 5

Forward Citations = 150(Granted Patents)


Company Filing History:


Years Active: 1999-2009

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8 patents (USPTO):

Title: Innovator Spotlight: Chin-Hung Jwo

Introduction: Chin-Hung Jwo is a notable inventor based in Mount Sinai, New York, recognized for his contributions to innovative scanning technologies. With a total of eight patents to his name, Jwo demonstrates a commitment to advancing the field of multi-optic scanning.

Latest Patents: One of his latest patents is a scanner featuring vertical plate force detection and compensation. This invention describes a sophisticated multi-optic scanner capable of detecting and measuring weight placed on its vertical plate. In one embodiment, part of the vertical plate is positioned beneath a horizontal plate, allowing the force exerted on the vertical plate to be partially or fully transferred to the horizontal plate. Additionally, some embodiments include one or more sensors coupled to the vertical plate to detect force, which can connect to an alert system, such as an audible signal, to warn operators of misread weights.

Career Highlights: Chin-Hung Jwo plays a significant role at Symbol Technologies, LLC, where he applies his expertise in developing cutting-edge scanning technologies. His dedication and innovative mindset have contributed substantially to the company's product offerings and reputation in the market.

Collaborations: Jwo collaborates with talented colleagues, including Edward D. Barkan and Paul Dvorkis, who share his passion for invention and technology. This collaboration fosters a creative environment that leads to impactful innovations in the field.

Conclusion: As an inventor, Chin-Hung Jwo’s work exemplifies the spirit of innovation and progress in scanning technology. His latest patents and collaborations underline his ongoing commitment to enhancing the capabilities of scanning devices, ultimately contributing to improved efficiency and accuracy in various applications.

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