Chin-Chen Huang

Title: Inventor Chin-Chen Huang: Innovations in Photosensitive Resin Technologies

Introduction

Chin-Chen Huang is a notable inventor based in Taoyuan, Taiwan, recognized for his contributions to the field of photosensitive resin compositions. With two patents to his name, Huang's work primarily focuses on the development of advanced materials for various optical applications.

Latest Patents

Huang's latest patents include innovative formulations that enhance the performance and functionality of photosensitive resins. The first patent describes a photosensitive resin composition for imprinting, which comprises a resin (A), an ethylenically unsaturated monomer (B), a photoinitiator (C), a solvent (D), and a hydrophobic oligomer (E). This composition is designed for creating cured articles and optical elements, with the resin (A) possessing a weight average molecular weight ranging from 1,000 to 50,000 and featuring two or more ethylenic polymerizable groups.

His second patent introduces a black resin composition, a cured film, and a black filter. This composition contains a black coloring agent (A), an ethylenically unsaturated monomer (B), a solvent (C), a resin (D), a photoinitiator (E), a UV absorber (F), and a surfactant (G). The resin (D) is noted for including a first resin with a weight-average molecular weight between 2,000 and 20,000, which incorporates a structural unit featuring a fluorene ring and two or more ethylenically polymerizable groups. Additionally, the UV absorber (F) is made from a benzylidene-based derivative.

Career Highlights

Chin-Chen Huang currently works at Echem Solutions Corp., where he has played a pivotal role in advancing resin technology. His innovative approaches have positioned him and his company as leaders in materials science, particularly for applications requiring precision and durability.

Collaborations

Throughout his career, Huang has collaborated with notable colleagues, including Yu-Lun Li and Chen-Wen Chiu. Together, they have contributed to the research and development of cutting-edge materials that are critical to the industry.

Conclusion

Chin-Chen Huang’s contributions to the field of photosensitive resin compositions underscore the significance of innovation in material science. His patents demonstrate a commitment to developing high-performance materials that enhance optical functionalities. As the industry continues to evolve, Huang's inventions will undoubtedly play a crucial role in shaping future technologies.