Annaka, Japan

Chikara Mori

USPTO Granted Patents = 5 

Average Co-Inventor Count = 3.5

ph-index = 2

Forward Citations = 6(Granted Patents)


Location History:

  • Gunma, JP (2023)
  • Annaka, JP (2017 - 2024)

Company Filing History:


Years Active: 2017-2024

Loading Chart...
5 patents (USPTO):Explore Patents

Title: Chikara Mori: Innovator in Chemical Vapor Deposition and Semiconductor Manufacturing

Introduction

Chikara Mori is a prominent inventor based in Annaka, Japan. He has made significant contributions to the field of chemical vapor deposition and semiconductor manufacturing. With a total of 5 patents to his name, Mori's work has had a substantial impact on the industry.

Latest Patents

Mori's latest patents include a method of forming a film on a substrate by chemical vapor deposition. This innovative method involves a reaction container with two holding members, allowing for efficient film formation on the substrate. The process includes moving the substrate between the holding members to optimize the deposition process. Another notable patent is for a tantalum carbide coated carbon material, which enhances the longevity of semiconductor manufacturing apparatus. This material features a tantalum carbide coated film that exhibits superior structural properties, making it ideal for high-performance applications.

Career Highlights

Chikara Mori is currently associated with Shin-Etsu Chemical Co., Ltd., where he continues to advance his research and development efforts. His work has been instrumental in improving manufacturing processes and materials used in semiconductor technology.

Collaborations

Mori has collaborated with notable colleagues such as Hiroyuki Otsuka and Takenori Watabe. These partnerships have fostered innovation and contributed to the success of various projects within the semiconductor industry.

Conclusion

Chikara Mori's contributions to chemical vapor deposition and semiconductor manufacturing highlight his role as a leading inventor in the field. His innovative patents and collaborations continue to shape the future of technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…