Hsinchu, Taiwan

Chih-Shen Fan

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Chih-Shen Fan: Innovator in Lithography Technology

Introduction

Chih-Shen Fan is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of lithography, particularly through his innovative designs and patents. His work is essential in advancing technology in various applications.

Latest Patents

Chih-Shen Fan holds a patent for an alignment mark of a lithography mask. This patent includes a unique design comprising a first bar, a second bar crossing the first bar, and a specific pattern with different signatures. The first and second bars connect to the second bar, showcasing his inventive approach to improving lithography processes. He has 1 patent to his name.

Career Highlights

Chih-Shen Fan is currently employed at Visera Technologies Company Limited, where he continues to develop and refine lithography technologies. His expertise and innovative mindset have made him a valuable asset to the company.

Collaborations

Chih-Shen has collaborated with talented coworkers, including Li-Wei Chen and I-Chin Sung. Their combined efforts contribute to the advancement of technology in their field.

Conclusion

Chih-Shen Fan is a distinguished inventor whose work in lithography technology has made a significant impact. His innovative designs and patents continue to influence the industry, showcasing his dedication to advancing technology.

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