Chih Pin Pan

Title: Chih Pin Pan: Innovator in Microstructure Modification

Introduction

Chih Pin Pan is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of microstructure modification, particularly in conducting lines. His innovative approach has led to advancements in the electroplating process, which is crucial for various applications in electronics.

Latest Patents

Chih Pin Pan holds a patent for a method titled "Method for microstructure modification of conducting lines." This patent describes a process where an electroplating technique is utilized to deposit metal thin films or conducting lines with a face-centered cubic (FCC) structure. The process ensures a preferred crystallographic orientation over a substrate's surface. Following the deposition, a thermal annealing process is applied to modify the microstructure, achieving grain sizes ranging from 5 µm to 100 µm. The thermal annealing is conducted at temperatures above 25 degrees Celsius and below 240 degrees Celsius, enhancing the properties of the conducting lines.

Career Highlights

Chih Pin Pan is affiliated with Yuan Ze University, where he continues to engage in research and development. His work has not only contributed to academic knowledge but has also practical implications in the electronics industry. His dedication to innovation is evident in his patent and ongoing research efforts.

Collaborations

Chih Pin Pan collaborates with esteemed colleagues, including Cheng En Ho and Cheng Yu Lee. These partnerships foster a dynamic research environment, allowing for the exchange of ideas and expertise in the field of microstructure modification.

Conclusion

Chih Pin Pan is a distinguished inventor whose work in microstructure modification has the potential to impact various technological applications. His contributions through patents and collaborations highlight his commitment to advancing the field.