Location History:
- Tu-Cheng, TW (2011)
- New Taipei, TW (2015)
Company Filing History:
Years Active: 2011-2025
Title: Chih-Lung Lin: Innovator in Intelligent Systems and Materials
Introduction
Chih-Lung Lin is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the fields of intelligent systems and materials, holding a total of 4 patents. His innovative work has garnered attention in various industries, showcasing his expertise and creativity.
Latest Patents
One of his latest patents is the "Intelligent expanding similar word model system and method thereof." This invention provides a system operated in a database system host, which includes a character analysis unit, a candidate word generation unit, a recognition rate processing unit, a false waking-up rate processing unit, and an adjustment unit. These components work together to enhance the accuracy of word recognition in various applications.
Another notable patent is the "Modified polyurethane carrier substrate." This substrate is formed from a modified polyurethane that includes both soft and hard segments. The soft segment is derived from a polyol, while the hard segment is created from diisocyanate and a chain extender, specifically dianhydride. The unique properties of this modified polyurethane allow for a specific range of storage modulus ratios, making it suitable for various applications.
Career Highlights
Chih-Lung Lin has worked with several notable companies, including Chi Mei Communication Systems, Inc. and Cyberon Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in technology and materials.
Collaborations
Throughout his career, Chih-Lung Lin has collaborated with talented individuals such as Ming-Shiung Chang and Kuo-Heng Sun. These partnerships have fostered a creative environment that has led to the development of groundbreaking inventions.
Conclusion
Chih-Lung Lin is a distinguished inventor whose work in intelligent systems and materials has made a significant impact. His patents reflect his innovative spirit and dedication to advancing technology. His contributions continue to inspire future generations of inventors and researchers.