Chih-Hsiung Chang

Title: Chih-Hsiung Chang: Innovator in Display Technology

Introduction

Chih-Hsiung Chang is a notable inventor based in Miao-Li County, Taiwan. He has made significant contributions to the field of display technology, showcasing his innovative spirit through his patented inventions.

Latest Patents

Chih-Hsiung Chang holds a patent for a display device. This device includes a substrate, a channel layer, a first metal layer, and a second metal layer. The channel layer is positioned on the substrate and consists of a first channel layer and a second channel layer. The first metal layer is placed on the channel layer and features a first gate and a second gate. The second metal layer is situated above the first metal layer and contains a first source, a first drain, and a second source. The first gate, the first source, the first drain, and the first channel layer together form a first transistor. Meanwhile, the second gate, the second source, the first drain, and the second channel layer create a second transistor. Notably, the first transistor and the second transistor are connected in parallel. This innovative design enhances the functionality and efficiency of display devices.

Career Highlights

Chih-Hsiung Chang is currently employed at Innolux Corporation, a leading company in the display technology sector. His work at Innolux has allowed him to further develop his expertise and contribute to advancements in display technology.

Collaborations

Chih-Hsiung Chang has collaborated with talented coworkers such as Chin-Lung Ting and Cheng-Hsu Chou. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Chih-Hsiung Chang is a prominent inventor whose work in display technology has made a significant impact. His patent for a display device exemplifies his innovative approach and dedication to advancing technology. His contributions continue to shape the future of display devices.