Hsinchu, Taiwan

Chih-Hsiang Wu


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Inventor Chih-Hsiang Wu: Innovations in Semiconductor Etching

Introduction

Chih-Hsiang Wu, a talented inventor based in Hsinchu, Taiwan, has made significant contributions to the field of semiconductor manufacturing. His innovative approach to etching processes is exemplified by his patented method that focuses on the selective etching of silicon nitride with respect to silicon oxide. This advancement is invaluable for the efficient fabrication of electronic components.

Latest Patents

Chih-Hsiang Wu holds one patent titled "Highly Selective Oxygen Free Silicon Nitride Etch." This invention introduces a method for selectively etching silicon nitride using an oxygen-free silicon nitride etch gas comprised of CFor CHF (X≥1, Y≥1, Z≥1). The process involves providing RF power to form the etch gas into a plasma, effectively exposing silicon nitride to this plasma for precise etching. This patent highlights Wu's expertise in developing effective solutions that enhance semiconductor manufacturing capabilities.

Career Highlights

Chih-Hsiang Wu is currently associated with Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has positioned him as a key player in advancing etching technologies that support the production of cutting-edge electronic devices.

Collaborations

During his career, Chih-Hsiang Wu has collaborated with other skilled professionals in the field, including Bhaskar Nagabhirava and Seongjun Heo. These partnerships have fostered an environment of innovation and creativity, enabling the development of groundbreaking solutions that address complex challenges in semiconductor processing.

Conclusion

Chih-Hsiang Wu's inventive spirit and dedication to advancing semiconductor technology have earned him recognition as an influential inventor. His patent for a highly selective oxygen-free silicon nitride etch showcases his ability to devise innovative methods that improve manufacturing processes. As the semiconductor industry continues to evolve, inventors like Wu play a crucial role in driving advancements that shape the future of technology.

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