Company Filing History:
Years Active: 1998-1999
Title: Chiaki Hatsuda: Innovator in Phase Shift Mask Technology
Introduction
Chiaki Hatsuda is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of photolithography, particularly in the development of phase shift masks. With a total of 2 patents, her work has advanced the technology used in semiconductor manufacturing.
Latest Patents
One of her latest patents is focused on a phase shift mask and the method of producing the same. This innovation involves a halftone phase shift mask that does not require the formation of ultra-fine patterns. It effectively suppresses the occurrence of a sub-peak of light intensity during exposure, which can adversely affect image formation. The mask features a light-blocking pattern with reduced transmittance in regions outside the device pattern area, which corresponds to areas subjected to multiple exposures during transfer. The halftone phase shift mask is constructed on a transparent substrate and includes a halftone phase shift film that may consist of a single layer or multiple layers. The composition of this film is altered in specific regions to enhance performance during the exposure process.
Career Highlights
Chiaki Hatsuda is currently employed at Dai Nippon Printing Co., Ltd., where she continues to innovate in the field of photolithography. Her expertise and contributions have positioned her as a key figure in the development of advanced manufacturing technologies.
Collaborations
Throughout her career, Chiaki has collaborated with notable colleagues, including Toshifumi Yokoyama and Koichi Mikami. These partnerships have further enriched her work and expanded the impact of her inventions.
Conclusion
Chiaki Hatsuda's contributions to the field of phase shift mask technology exemplify her innovative spirit and dedication to advancing semiconductor manufacturing. Her patents reflect a commitment to improving the efficiency and effectiveness of photolithography processes.