Chiaki Azuma

Title: Chiaki Azuma: Innovator in Ionizing Radiation Lithography

Introduction

Chiaki Azuma is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of materials science, particularly in the development of advanced resist materials for lithography. Her innovative work has garnered attention in both academic and industrial circles.

Latest Patents

Chiaki Azuma holds a patent for a negative-type acetalized polyvinyl alcohol resist sensitive to ionizing radiation. This acetalized polyvinyl alcohol has a molecular weight ranging from 10,000 to 1,000,000. It is represented by a specific chemical formula, where R¹ denotes a halogen-containing residue of an aldehyde or a ketone, R² represents a hydrogen atom that may be partially substituted with an acetyl group, and R³ can either be absent or a monomeric unit copolymerizable with vinyl acetate. The integers l, m, and n indicate the polymerization degrees. This innovative material exhibits excellent characteristics such as high sensitivity, high resolving power, and outstanding dry etching resistance, making it suitable for use as a negative-type resist in ionizing radiation lithography.

Career Highlights

Chiaki Azuma is currently associated with Dai Nippon Insatsu Kabushiki Kaisha, a leading company in the printing and imaging industry. Her work has been instrumental in advancing the capabilities of lithographic processes, particularly in the context of ionizing radiation applications.

Collaborations

Throughout her career, Chiaki has collaborated with notable colleagues, including Naoya Ogata and Kohei Sanui. These collaborations have further enriched her research and development efforts, leading to innovative solutions in the field.

Conclusion

Chiaki Azuma's contributions to the field of ionizing radiation lithography through her innovative patent highlight her role as a leading inventor. Her work continues to influence advancements in materials science and lithographic technology.