Company Filing History:
Years Active: 2011
Title: Innovations by Chia-Hsu Chang in Thin Film Transistor Technology
Introduction
Chia-Hsu Chang, an innovator based in Hsin-Chu, Taiwan, has made significant contributions to the field of thin film transistor technology. With one patent to his name, he continues to push the boundaries of innovation in electronics.
Latest Patents
Chia-Hsu Chang holds a patent for a "Display Panel and Rework Method of Gate Insulating Layer of Thin Film Transistor." This invention presents a novel rework method for the gate insulating layer of a thin film transistor. The process begins with a substrate that features a silicon nitride layer, which acts as the gate insulating layer. A first film removal process is employed to eliminate the silicon nitride layer, utilizing an inductively coupled plasma (ICP) etching technique. This ICP etching process introduces gases such as sulfur hexafluoride and oxygen and exhibits an etching selectivity ratio for the silicon nitride layer to the substrate, maintaining a value between 18 and 30.
Career Highlights
Chia-Hsu Chang is currently associated with AU Optronics Corporation, a key player in the manufacturing of display panels. His expertise and innovative thinking contribute to the company's cutting-edge advancements in display technology.
Collaborations
Working alongside talented individuals like Pei-Yu Chen, Chang has contributed to a collaborative environment focused on enhancing technology in the field. Their teamwork has the potential to lead to further advancements and innovations within the company.
Conclusion
Chia-Hsu Chang stands out as a prominent inventor in the realm of thin film transistors. Through his pioneering patent and collaboration at AU Optronics Corporation, he exemplifies the spirit of innovation and dedication necessary to advance the technology landscape. His work not only enhances display technology but also paves the way for future inventions in the industry.