Gyeonggi-do, South Korea

Chi Young Lee

This inventor holds 1 USPTO granted patent. Top assignee: Psk Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chi Young Lee. Retrieved from https://idiyas.com/inventor/chi-young-lee-uughzkc2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Chi Young Lee

Introduction

Chi Young Lee is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate processing technology. His work is characterized by a focus on enhancing the efficiency and effectiveness of substrate processing apparatuses.

Latest Patents

Chi Young Lee holds a patent for a substrate processing apparatus. This innovative apparatus includes a chamber with a processing space, a support unit for holding the substrate, a gas supply unit for delivering process gas, and a plasma generation unit. The plasma generation unit is designed with an inner coil part and an outer coil part, which work together to generate plasma from the process gas. This invention aims to improve the processing of substrates in various applications.

Career Highlights

Chi Young Lee is currently employed at Psk Inc., where he continues to develop and refine technologies related to substrate processing. His expertise in this area has positioned him as a valuable asset to his company and the industry at large.

Collaborations

Throughout his career, Chi Young Lee has collaborated with talented individuals such as A Ram Kim and Soo Yeong Yang. These collaborations have fostered innovation and contributed to the advancement of substrate processing technologies.

Conclusion

Chi Young Lee's contributions to substrate processing technology exemplify the spirit of innovation. His patent and ongoing work at Psk Inc. highlight his commitment to advancing this important field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…