Company Filing History:
Years Active: 2015-2017
Title: Innovations of Chi W Chiu
Introduction
Chi W Chiu is an accomplished inventor based in Freehold, NJ (US). He has made significant contributions to the field of printing technology, holding a total of 2 patents. His work focuses on developing advanced printing form precursors that enhance the quality and efficiency of printing processes.
Latest Patents
Chi W Chiu's latest patents include a printing form precursor having an elastomeric cap layer and a method of preparing a printing form from the precursor. This invention pertains to a printing form precursor that includes a photopolymerizable layer, an elastomeric layer with at least an elastomeric binder and particulate, and an actinic radiation opaque material positioned above the elastomeric layer opposite the photopolymerizable layer. The particulate is specifically selected from material particles with an average diameter ranging from 1 to 10 microns and a refractive index that is within 0.04 units of the index of refraction of the composition forming the elastomeric layer.
Career Highlights
Chi W Chiu is currently employed at E.I. du Pont de Nemours and Company, where he continues to innovate in the field of printing technology. His work has been instrumental in advancing the capabilities of printing forms, making them more effective and reliable.
Collaborations
Throughout his career, Chi has collaborated with notable colleagues, including Robert M Blomquist and John Stephen Locke. These collaborations have contributed to the development of innovative solutions in the printing industry.
Conclusion
Chi W Chiu is a prominent inventor whose work in printing technology has led to significant advancements in the field. His patents reflect his commitment to innovation and excellence in the industry.