Company Filing History:
Years Active: 2013
Title: The Innovations of Chi-Min Yang
Introduction
Chi-Min Yang is a notable inventor based in Changhua County, Taiwan. He has made significant contributions to the field of exposure apparatus technology. His work focuses on methods for forming patterned layers, which are essential in various applications, particularly in the semiconductor industry.
Latest Patents
Chi-Min Yang holds a patent for an exposure apparatus designed to expose a photoresist layer on a substrate to create multiple strip exposed patterns. This innovative apparatus includes a light source, a lens group, and a mask. The lens group consists of several strip lenses arranged parallel to one another, with specific regions defined for optimal exposure. The mask features shielding patterns that correspond to the strip exposed patterns, enhancing the precision of the exposure process. This patent showcases his expertise in developing advanced technologies for pattern formation, with a total of 1 patent to his name.
Career Highlights
Chi-Min Yang is currently employed at AU Optronics Corporation, a leading company in the display technology sector. His role involves research and development, where he applies his innovative ideas to improve exposure apparatus technologies. His contributions have been instrumental in advancing the capabilities of the company's products.
Collaborations
Throughout his career, Chi-Min Yang has collaborated with talented individuals such as Hsiang-Chih Hsiao and Ta-Wen Liao. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Chi-Min Yang's work in the field of exposure apparatus technology exemplifies his commitment to innovation and excellence. His patent and contributions to AU Optronics Corporation highlight his role as a key player in advancing technology in the semiconductor industry.