Company Filing History:
Years Active: 2013-2016
Title: Chi-Hung Yang: Innovator in Photolithography Technology
Introduction
Chi-Hung Yang is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of photolithography, particularly in the development of methods and apparatuses for forming patterned layers. With a total of 3 patents to his name, Yang's work has advanced the technology used in various applications.
Latest Patents
Yang's latest patents include innovative methods such as the "Method of forming patterned layer," the "Method of forming patterned photoresist layer," and the "Active device array substrate." His exposure apparatus is designed to expose a photoresist layer on a substrate, creating multiple strip exposed patterns. This apparatus features a light source, a lens group, and a mask. The lens group consists of several strip lenses arranged parallel to one another, with specific regions defined for optimal exposure. The mask includes shielding patterns that correspond to the strip exposed patterns, enhancing the precision of the exposure process.
Career Highlights
Chi-Hung Yang is currently employed at AU Optronics Corporation, where he continues to innovate in the field of optical technologies. His work has been instrumental in improving the efficiency and effectiveness of photolithography processes.
Collaborations
Yang has collaborated with notable colleagues, including Hsiang-Chih Hsiao and Ta-Wen Liao, contributing to a dynamic research environment that fosters innovation.
Conclusion
Chi-Hung Yang's contributions to photolithography technology exemplify the impact of innovative thinking in the field of optics. His patents and ongoing work at AU Optronics Corporation highlight his role as a key figure in advancing this critical technology.