Company Filing History:
Years Active: 2000
Title: Chi-Dar Huang: Innovator in Capacitor Technology
Introduction
Chi-Dar Huang is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of capacitor technology, particularly through his innovative methods that enhance the performance of capacitors. His work is recognized for its practical applications in various electronic devices.
Latest Patents
Chi-Dar Huang holds a patent titled "Method for increasing capacity of a capacitor." This invention relates to a method that involves forming a polysilicon spacer on the sidewall of a first polysilicon electrode. The process includes treating the polysilicon spacer with phosphoric acid to create a roughened surface area. This arrangement effectively increases the overall surface area of both the polysilicon spacer and the first polysilicon electrode, thereby enhancing the capacity of the capacitor. He has 1 patent to his name.
Career Highlights
Chi-Dar Huang is associated with Mosel Vitelic Corporation, where he applies his expertise in capacitor technology. His work at the company has contributed to advancements in electronic components, making them more efficient and reliable.
Collaborations
Chi-Dar Huang has collaborated with notable colleagues, including Chih-Hsun Chu and Chien-Hung Chen. These collaborations have fostered a productive environment for innovation and development in their respective fields.
Conclusion
Chi-Dar Huang's contributions to capacitor technology exemplify the impact of innovative thinking in the electronics industry. His patent and work at Mosel Vitelic Corporation highlight his role as a key inventor in enhancing electronic component performance.