Potsdam, NY, United States of America

Chenyu Lin

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Location History:

  • Potstdam, NY (US) (2018)
  • Potsdam, NY (US) (2019)

Company Filing History:


Years Active: 2018-2019

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2 patents (USPTO):Explore Patents

Title: Innovations of Chenyu Lin in Fluorosilicone Technology

Introduction

Chenyu Lin is an accomplished inventor based in Potsdam, NY (US), known for his significant contributions to the field of fluorosilicone technology. With a total of two patents to his name, Lin has developed innovative solutions that enhance manufacturing processes and improve product performance.

Latest Patents

Lin's latest patents include a "Fluorosilicone composite and formulation process for imaging plate" and an "Imaging plate multi-layer blanket." The first patent describes an apparatus and method for manufacturing a fluorosilicone composite used in variable data lithography imaging member surface layers. This composite consists of a first part containing fluorosilicone, carbon black, silica, and butyl acetate, along with a second part that includes a platinum catalyst, a crosslinker, butyl acetate, and an inhibitor. Notably, the first part may also incorporate a dispersant, such as a polyoxyalkylene amine derivative, which eliminates the need for shaking the dispersion by paint shaker and facilitates a more manufacture-friendly roll ball milling process. This dispersant also aids in stabilizing the fluorosilicone composite for scaled-up production.

The second patent focuses on an apparatus and method for manufacturing a multi-layer image blanket featuring a platinum-catalyzed fluorosilicone topcoat for variable data lithography printing systems. This blanket comprises multiple layers, which may include a commercial carcass with a sulfur-free rubber outer layer, a suitable primer layer for enhancing inter-layer adhesion, and the platinum-catalyzed fluorosilicone topcoat. Alternatively, it may consist of a seamless polyimide substrate coated with platinum-cured silicone, a primer layer, and the fluorosilicone topcoat.

Career Highlights

Chenyu Lin is currently employed at Xerox Corporation, where he continues to push the boundaries of innovation in imaging technologies. His work has significantly impacted the efficiency and effectiveness of lithography processes.

Collaborations

Lin collaborates with talented colleagues, including Mandakini Kanungo and Kevin H Taft, who contribute to the advancement of their projects and innovations.

Conclusion

Chenyu Lin's contributions to fluorosilicone technology exemplify the spirit of innovation in the field of imaging solutions. His patents reflect a commitment to enhancing manufacturing processes and product performance, making him a notable figure

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