Chenming Zhang

Title: Chenming Zhang: Innovator in Semiconductor Manufacturing

Introduction

Chenming Zhang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 2 patents. His innovative work focuses on improving the accuracy and efficiency of photomask patterns used in semiconductor fabrication.

Latest Patents

Chenming Zhang's latest patents include a "Layout Pattern Modification Method" and a "Method of Making Optical Proximity Correction to Original Gate Photomask Pattern Based on Different Substrate Areas." The layout pattern modification method involves a series of steps to ensure that post-OPC patterns comply with manufacturing rules. This process includes performing an OPC process, conducting manufacturing rule checks, and rotating patterns as necessary to achieve compliance. The second patent addresses the need for Optical Proximity Correction (OPC) in gate photomask patterns, creating two distinct optical proximity effect models to enhance the accuracy of dimensions based on different substrate areas.

Career Highlights

Chenming Zhang is currently employed at Shanghai Huali Microelectronics Corporation, where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the manufacturing processes within the company, contributing to the development of more precise photomask patterns.

Collaborations

Throughout his career, Chenming has collaborated with notable colleagues, including Fang Wei and Hsusheng Chang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Chenming Zhang's contributions to semiconductor manufacturing through his patents and collaborative efforts highlight his role as a key innovator in the industry. His work continues to influence the field, paving the way for advancements in technology and manufacturing processes.