Taipei, Taiwan

Cheng-Ju Lee


Average Co-Inventor Count = 4.0

ph-index = 3

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 2014-2024

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8 patents (USPTO):Explore Patents

Title: Cheng-Ju Lee: Innovator in EUV Technology

Introduction

Cheng-Ju Lee is a prominent inventor based in New Taipei, Taiwan. He has made significant contributions to the field of technology, particularly in the development of advanced equipment for the semiconductor industry. With a total of eight patents to his name, Lee's work has had a substantial impact on innovation in this sector.

Latest Patents

One of Cheng-Ju Lee's latest patents is for a notebook computer's EUV reticle pod. This innovative design includes an inner and an outer box assembly. The inner box assembly contains a base and a cover, where the base features an upper surface with a carry surface, at least one trench, and a first contacting surface. The EUV reticle is positioned above the carry surface, while the trench, designed with a circular loop structure, effectively captures and traps particles to minimize contamination on the reticle. The cover is equipped with a concave for accommodating the EUV reticle and a second contacting surface that collaborates with the first contacting surface to create an air-tight seal.

Career Highlights

Throughout his career, Cheng-Ju Lee has worked with notable companies such as Gudeng Precision Industrial Co., Ltd. and Acer Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the industry.

Collaborations

Cheng-Ju Lee has collaborated with talented individuals, including Hsin-Min Hsueh and Chia-Ho Chuang. These partnerships have fostered a creative environment that has led to innovative solutions in their projects.

Conclusion

Cheng-Ju Lee's contributions to the field of technology, particularly in EUV reticle pod design, showcase his innovative spirit and dedication to advancing the semiconductor industry. His patents and collaborations reflect a commitment to excellence and a drive for continuous improvement in technology.

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