Chen-Lung Lin is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of advanced graphite films and polyamide-imides. With a total of 5 patents to his name, Lin's work is recognized for its innovative approaches and practical applications.

Latest Patents

Among his latest patents, Lin has developed a polyamide-imide represented by a specific formula. This invention includes a graphite film that is prepared through a thermal treatment process, which operates within a temperature range of 25°C to 2,900°C. Another notable patent involves a graphite oxide-containing resin formulation. This formulation comprises 15-80 parts by weight of a polyamideimide precursor, 0.01-10 parts by weight of graphite oxide as a dispersant, 10-400 parts by weight of inorganic powder, and 20-350 parts by weight of a solvent.

Career Highlights

Lin is affiliated with the Industrial Technology Research Institute, where he has been instrumental in advancing research and development in his field. His innovative work has not only contributed to academic knowledge but has also paved the way for practical applications in various industries.

Collaborations

Lin has collaborated with notable colleagues, including Kuo-Chan Chiou and Meng-Ju Wu. These partnerships have fostered a collaborative environment that enhances the research output and innovation potential within their projects.

Conclusion

Chen-Lung Lin stands out as a key figure in the realm of graphite film technology and polyamide-imides. His contributions through patents and collaborations continue to influence advancements in materials science.

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