Tainan, Taiwan

Chen-Chien Hung


Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations of Chen-Chien Hung in Digital Lithography

Introduction

Chen-Chien Hung is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of digital lithography, particularly through his innovative patent. His work focuses on optimizing digital pattern files, which are crucial for enhancing the efficiency of lithography devices.

Latest Patents

Chen-Chien Hung holds a patent titled "Optimization of a digital pattern file for a digital lithography device." This patent describes a digital pattern generation system that includes a memory and a controller. The controller is designed to remove redundant cells from a digital pattern file, generate a first updated digital pattern file, and compare it with the original digital pattern file. The process further involves reducing the number of vertexes of a first arc in the updated file to create a second updated digital pattern file. Additionally, the first cell of this second file is replaced with an alternative version to generate a third updated digital pattern file. Finally, one or more polygons within this third file are converted into quad polygons, resulting in an optimized digital pattern file.

Career Highlights

Chen-Chien Hung is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at Applied Materials has allowed him to apply his innovative ideas and contribute to advancements in digital lithography technology.

Collaborations

Throughout his career, Chen-Chien Hung has collaborated with esteemed colleagues, including Chung-Shin Kang and Thomas L Laidig. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies in the industry.

Conclusion

Chen-Chien Hung's contributions to digital lithography through his innovative patent demonstrate his expertise and commitment to advancing technology in this field. His work continues to influence the efficiency of lithography devices, showcasing the importance of innovation in engineering.

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