Company Filing History:
Years Active: 2007
Title: The Innovative Contributions of Chee Khiang Ivan Sim in Dual Damascene Etch Processes
Introduction: Chee Khiang Ivan Sim is an inventive spirit based in Singapore, known for his significant advancements in the field of semiconductor fabrication. With a focus on etching processes, Ivan has made notable contributions that enhance the precision and efficiency of integrated circuit manufacturing.
Latest Patents: Ivan holds a patent for a groundbreaking method known as "Dual damascene etch processes." This innovative process encompasses a two-step BARC (Bottom Anti-Reflection Coating) etching technique. The first step utilizes a fluorocarbon-based plasma to remove a portion of the BARC covering a dielectric stack, while the second step employs O/N-based plasma for further removal. This meticulous process not only addresses the challenges of traditional etching methods but also includes a low-k dielectric etching process to avoid argon-induced facet formation.
Career Highlights: Currently, Chee Khiang Ivan Sim is a valuable member of Applied Materials, Inc., a leading company in providing equipment, services, and software for the fabrication of semiconductor devices. His expertise in etching processes has contributed to the development of cutting-edge technologies in the semiconductor industry.
Collaborations: Throughout his career, Ivan has collaborated with esteemed colleagues, including Hiroya Tanaka and Alok Jain. These partnerships have facilitated the exchange of innovative ideas and fostered advancements in the field, reflecting the importance of teamwork in scientific achievements.
Conclusion: Chee Khiang Ivan Sim stands out as a dedicated inventor whose contributions to dual damascene etching processes pave the way for improved techniques in semiconductor manufacturing. His innovative spirit and collaborative efforts exemplify the importance of invention and continuous improvement in technology. Ivan's work not only highlights his skills as an inventor but also the potential for future innovations in the industry.