Chau Arima

Title: Chau Arima: Innovator in Plasma Processing Techniques

Introduction

Chau Arima is a notable inventor based in Fremont, CA (US). He has made significant contributions to the field of plasma processing, particularly in techniques for etching with a photoresist mask. His innovative methods have implications for semiconductor manufacturing and related technologies.

Latest Patents

Chau Arima holds 1 patent for his work titled "Techniques for etching with a photoresist mask." This patent discloses a method for improving profile control during the etching of a nitride layer disposed above a silicon substrate. The process involves positioning the substrate, including the nitride layer and the photoresist mask, in a plasma processing chamber. It includes flowing a chlorine-containing etchant source gas into the chamber and igniting a plasma to form a chlorine-based plasma. The treatment of the photoresist is designed to etch a portion of the mask while depositing passivation polymer on the vertical sidewalls without etching through the nitride layer.

Career Highlights

Chau Arima is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to develop and refine techniques that enhance the efficiency and effectiveness of plasma processing.

Collaborations

Chau has collaborated with several professionals in his field, including Barbara Haselden and John Lee. These collaborations have contributed to the advancement of technologies in plasma processing and semiconductor manufacturing.

Conclusion

Chau Arima's innovative techniques in plasma processing demonstrate his commitment to advancing semiconductor technology. His contributions are vital to the ongoing development of efficient manufacturing processes in the industry.