Company Filing History:
Years Active: 1985
Title: Innovations of Charles S Biechler in E-beam Lithography
Introduction
Charles S Biechler is a notable inventor based in Hayward, CA (US). He has made significant contributions to the field of lithography, particularly through his innovative techniques in E-beam lithography. His work has implications for enhancing the resolution of feature widths in lithographic systems.
Latest Patents
Biechler holds a patent for "Virtual addressing for E-beam lithography." This technique is performed in a fixed address particle beam lithographic system. The writing is executed in the conventional manner for creating patterns, such as stripes on a resist with a selected feature width. An additional row of alternate pixels is written either before or after the selected feature. The alternate pixels, when the resist is developed, provide a feature width of approximately 1/2 a pixel wider than the selected feature width. This enhancement is due to the blurring of the latent image caused by scattering of the particle beam within the resist. Consequently, the resolution of selectable feature widths is improved with minimal loss of throughput. The technique can also be utilized to lengthen a feature by 1/2 a pixel width. Although primarily disclosed in a raster scan machine, the technique is also applicable in a vector scan machine. A flow chart illustrating the invention's application while preparing the data to be written by the machine is also included in the patent.
Career Highlights
Biechler is associated with The Perkin-Elmer Corporation, where he has contributed to advancements in lithographic technology. His work has been instrumental in pushing the boundaries of what is possible in E-beam lithography.
Collaborations
Throughout his career, Biechler has collaborated with notable colleagues, including Allen M Carroll and Richard E Graves. These collaborations have fostered innovation and development in their respective fields.
Conclusion
Charles S Biechler's contributions to E-beam lithography exemplify the impact of innovative thinking in technology. His patent for virtual addressing enhances the resolution of lithographic systems, showcasing the importance of continuous advancement in this field.