Location History:
- Allison Park, PA (US) (1990 - 1997)
- McCandless Twp., Allegheny County, PA (US) (1997)
- McCandless Township, Allegheny County, PA (US) (1995 - 1998)
- McCandless Township, PA (US) (1996 - 1998)
Company Filing History:
Years Active: 1990-1998
Title: The Innovative Contributions of Charles F Kahle, II
Introduction
Charles F Kahle, II is a notable inventor based in Allison Park, PA (US). He has made significant contributions to the field of photochemistry and materials science, holding a total of 12 patents. His work primarily focuses on the development of photoactive compounds and resist compositions that enhance the performance of various applications.
Latest Patents
Kahle's latest patents include innovative advancements such as "Positive photoactive compounds based on 2,6-dinitro benzyl groups." This patent details the synthesis of photoreactive compounds derived from 2,5- or 2,6-dinitrobenzyl groups, along with methods for creating reactive monomers containing these groups. Another significant patent is "Electrodepositable photoimageable compositions with improved edge." This invention presents an enhanced electrodepositable photoimageable resist composition that incorporates a photosensitive composition and a microgel. The microgel, consisting of crosslinked organic particles, promotes edge coverage without compromising the photosensitivity and developability of the composition.
Career Highlights
Charles F Kahle, II is currently associated with PPG Industries, Inc., where he continues to innovate and contribute to the field. His work has been instrumental in advancing technologies that utilize photoactive materials, which are crucial in various industrial applications.
Collaborations
Kahle has collaborated with notable coworkers such as Gregory J McCollum and Raphael O Kollah. These partnerships have fostered a collaborative environment that enhances the innovation process and leads to groundbreaking developments in their field.
Conclusion
Charles F Kahle, II exemplifies the spirit of innovation through his extensive work in photochemistry and materials science. His contributions, particularly in the realm of photoactive compounds and resist compositions, have paved the way for advancements in various applications.