Company Filing History:
Years Active: 1988
Title: Innovations by Charles C Kau in Semiconductor Technology
Introduction
Charles C Kau is a notable inventor based in San Jose, California. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of MOS devices. His innovative approach has led to the development of a unique process that enhances the performance of field effect transistors.
Latest Patents
One of Kau's key patents is titled "Process for Fabricating Lightly Doped Drain MOS Devices." This patent outlines a method for creating a lightly doped drain field effect transistor structure. The process involves several steps, including the formation of an insulating material layer on a P-type substrate, the creation of a gate electrode, and the deposition of an etch-resistant layer. The method also details how to define spacer regions that serve as a mask for the implantation of source and drain regions. This innovative process allows for the formation of lightly doped portions of the source and drain regions, enhancing the overall efficiency of the devices.
Career Highlights
Charles C Kau has been associated with Vitelic Corporation, where he has applied his expertise in semiconductor fabrication. His work has been instrumental in advancing the technology used in modern electronic devices. Kau's dedication to innovation is evident in his patent, which reflects his commitment to improving semiconductor performance.
Collaborations
Kau has collaborated with Yaw Wen Hu, a fellow innovator in the field. Their partnership has contributed to the development of advanced technologies in semiconductor manufacturing.
Conclusion
Charles C Kau's contributions to the field of semiconductor technology, particularly through his patent for fabricating lightly doped drain MOS devices, highlight his innovative spirit and dedication to advancing electronic device performance. His work continues to influence the industry and pave the way for future innovations.