Chao H Tseng

Title: Innovations by Chao H Tseng: Advancements in Photoresist Technology

Introduction

Chao H Tseng, an accomplished inventor based in Taipei, Taiwan, has made significant contributions to the field of photoresist technology. His innovative approach has led to the development of a unique weak base developable positive photoresist composition, which is crucial in the manufacturing of color filters for liquid crystal displays.

Latest Patents

Chao H Tseng holds a patent for his invention, titled "Weak base developable positive photoresist composition." This composition includes a photosensitive compound, phenolic resin, and an organic solvent. The phenolic resin is synthesized from a specific monomeric mixture that consists of formaldehyde and a blend of phenol monomers. The innovative design of the photoresist allows for development using a weak basic solution, yielding images of sharp contrast that enhance the performance of color displays.

Career Highlights

Currently, Chao H Tseng is associated with the Industrial Technology Research Institute, where he continues to advance research in the field of materials science and photoresist technology. His commitment to innovation positions him as a notable figure in the industrial and technological landscape of Taiwan.

Collaborations

Chao has collaborated with reputable peers, such as Hua-Chi Cheng and Pao-Ju Hsieh, contributing to a dynamic environment of knowledge sharing and innovation. These collaborations emphasize the importance of teamwork in driving technological advancements and the successful development of new inventions.

Conclusion

Chao H Tseng stands as a pivotal inventor in the realm of photoresist compositions, with his innovative solutions significantly impacting the manufacturing processes used in modern technology. His dedication to research and collaboration underscores the vital role of inventors in pushing the boundaries of innovation.