Company Filing History:
Years Active: 2007
Title: Innovations of Chao Chin Wu in Display Technology
Introduction
Chao Chin Wu is a notable inventor based in Taipei County, Taiwan. He has made significant contributions to the field of display technology, holding a total of 2 patents. His work focuses on advancements in electrode substrates for flat panel displays, which are crucial for modern electronic devices.
Latest Patents
Chao Chin Wu's latest patents include innovative designs for display panels, electrode panels, and electrode substrates. One of his patents describes an electrode substrate that comprises a substrate, an electrode layer, a first barrier layer, a second barrier layer, and a conductive layer. The electrode layer is positioned above the substrate, while the first barrier layer is placed above the electrode layer. The second barrier layer is situated above the first barrier layer, and the conductive layer is located between the first and second barrier layers. Another patent outlines a similar electrode substrate, which includes a substrate, an electrode layer, a conductive layer, and a barrier layer, emphasizing the importance of these components in enhancing display performance.
Career Highlights
Chao Chin Wu is associated with Ritdisplay Corporation, where he applies his expertise in display technology. His role at the company allows him to contribute to the development of cutting-edge display solutions that meet the demands of the electronics market.
Collaborations
Chao Chin Wu has collaborated with talented coworkers such as Meng-Chieh Liao and Jiun-Haw Lee. Their combined efforts in research and development have led to advancements in display technologies.
Conclusion
Chao Chin Wu's innovative work in display technology, particularly in electrode substrates, showcases his commitment to enhancing electronic displays. His contributions are vital to the ongoing evolution of display technology in the industry.