Chapel Hill, NC, United States of America

Changkun Dong


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 27(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Changkun Dong: Innovator in Field Emission Ion Source Technology

Introduction

Changkun Dong is a prominent inventor based in Chapel Hill, NC (US). He has made significant contributions to the field of ion source technology, particularly through his innovative patent that focuses on nanostructure-containing materials. His work has implications for various applications in science and industry.

Latest Patents

Changkun Dong holds a patent for a "Field emission ion source based on nanostructure-containing material." This invention features a field emission ion source that incorporates nanostructure materials on at least the emitting edge of the anode electrode. The technology allows for the transfer of metal from a reservoir to the emitting edge, where it is ionized under an applied electric field. The design enables the combination of multiple ion sources to create a field emission ion source device, with selectable numbers of emitting sources and varying ion extraction potentials. The nanostructure materials used include single wall carbon nanotubes, few-walled carbon nanotubes, multi-walled carbon nanotubes, and carbon fiber. The integration of these materials into the anode is achieved through various methods, including electrophoresis and mechanical techniques.

Career Highlights

Changkun Dong is associated with Xintek, Inc., where he continues to advance his research and development efforts. His work has garnered attention for its innovative approach to ion source technology, which is critical for various scientific applications.

Collaborations

Changkun has collaborated with notable colleagues, including Otto Z Zhou and Jianping Lu. These partnerships have contributed to the advancement of his research and the development of new technologies in the field.

Conclusion

Changkun Dong's contributions to the field of ion source technology through his innovative patent demonstrate his commitment to advancing scientific knowledge and applications. His work continues to influence the development of new technologies in this area.

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