Changhyeong Yoon

Title: Changhyeong Yoon: Innovator in Semiconductor Metrology

Introduction

Changhyeong Yoon is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor metrology, holding 2 patents that enhance measurement techniques in this critical area of technology.

Latest Patents

Yoon's latest patents include a metrology apparatus and method based on diffraction using oblique illumination, as well as a method of manufacturing semiconductor devices utilizing this metrology method. The diffraction-based metrology apparatus features a light source that outputs a light beam, a stage for placing the object, and a reflective optical element that directs the light beam onto the object at an acute angle. This innovative design allows for high measurement sensitivity and accurate assessments of semiconductor devices. Additionally, the measurement system is capable of adjusting the angle of incidence (AOI), AOI spread, and azimuth of the incident light, further enhancing its versatility and effectiveness.

Career Highlights

Changhyeong Yoon is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing advanced metrology solutions that are essential for the manufacturing of high-performance semiconductor devices.

Collaborations

Yoon collaborates with talented colleagues, including Wookrae Kim and Jaehwang Jung, to drive innovation and improve measurement methodologies in the semiconductor industry.

Conclusion

Changhyeong Yoon's contributions to semiconductor metrology through his innovative patents and collaborative efforts at Samsung Electronics Co., Ltd. highlight his role as a key figure in advancing technology in this field. His work not only enhances measurement accuracy but also supports the ongoing evolution of semiconductor manufacturing processes.