Chang Se Byun

Title: Chang Se Byun: Innovator in Radiation-Curable Resin Technology

Introduction

Chang Se Byun is a notable inventor based in Gwangyang-si, South Korea. He has made significant contributions to the field of resin compositions, particularly in developing materials that are both functional and innovative. His work has implications for various industries, including coatings and materials science.

Latest Patents

Chang Se Byun holds a patent for a "Radiation curable resin composition, and fingerprint-resistant resin composition containing same." This invention provides a radiation-curable base resin composition that includes a multifunctional urethane(meth)acrylate with three or more functional groups, a bifunctional urethane(meth)acrylate, and a selection of (meth)acrylic acid ester monomers. The composition is designed to enhance durability and resistance to fingerprints, making it suitable for various applications.

Career Highlights

Throughout his career, Chang Se Byun has worked with prominent companies such as Posco and Samhwa Paints Industries Co., Ltd. His experience in these organizations has allowed him to refine his expertise in resin technology and contribute to innovative projects.

Collaborations

Chang has collaborated with talented individuals in his field, including Jin Tae Kim and Moon Jae Kwon. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Chang Se Byun's contributions to radiation-curable resin technology exemplify the impact of innovation in material science. His patent and career achievements highlight the importance of collaboration and expertise in driving advancements in this field.