Chang-kyu Hwang

Title: The Innovative Contributions of Chang-kyu Hwang

Chang-kyu Hwang is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the manufacturing of capacitors. His work has implications for the efficiency and reliability of semiconductor memory devices.

Latest Patents

Chang-kyu Hwang holds a patent for a method of manufacturing a multiple-walled capacitor of a semiconductor. This innovative method involves creating a double-cylindrical storage electrode for a capacitor in a semiconductor memory device. The process utilizes an outer etching mask to form an outer cylinder and an inner etching mask for the inner cylinder. By forming a conductive structure on a semiconductor substrate and employing anisotropic etching, Hwang's method allows for the creation of a double-cylindrical first electrode. This design minimizes the risk of structural fragmentation and reduces leakage current due to the absence of sharp edges.

Career Highlights

Hwang is currently associated with Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to contribute to advancements in semiconductor technology, enhancing the performance of memory devices.

Collaborations

Chang-kyu Hwang has collaborated with notable colleagues such as Sang-pil Sim and Joo-young Yun. These collaborations have fostered innovation and development in their respective fields.

Conclusion

In summary, Chang-kyu Hwang's contributions to semiconductor technology through his innovative patent have the potential to significantly impact the efficiency and reliability of memory devices. His work exemplifies the importance of innovation in advancing technology.