Chang-Ching Yeh

Title: Chang-Ching Yeh: Innovator in Semiconductor Technology

Introduction

Chang-Ching Yeh is a prominent inventor based in Santa Clara, CA. He has made significant contributions to the field of semiconductor technology, particularly in methods of fabricating highly conductive regions in semiconductor substrates for radio frequency applications. With a total of 2 patents, his work has had a notable impact on the industry.

Latest Patents

Chang-Ching Yeh's latest patents focus on innovative methods for creating highly conductive regions in semiconductor substrates. These methods are designed to fabricate two distinct structures. The first structure includes porous silicon regions that extend throughout the thickness of a silicon substrate, allowing for the formation of metallized posts and metallized moats within the porous regions. The second structure features staggered deep V-grooves or trenches that are etched into a silicon substrate or another semiconductor substrate. These grooves and trenches can be filled or coated with metal to create the metallized moats, enhancing the performance of radio frequency applications.

Career Highlights

Throughout his career, Chang-Ching Yeh has been associated with the University of California, where he has contributed to various research initiatives. His expertise in semiconductor technology has positioned him as a key figure in the development of advanced fabrication techniques.

Collaborations

Chang-Ching Yeh has collaborated with notable colleagues, including King-Ning Tu and Ya-Hong Xie. These partnerships have further enriched his research and innovation efforts in the semiconductor field.

Conclusion

Chang-Ching Yeh's work in semiconductor technology exemplifies the importance of innovation in advancing electronic applications. His patents and collaborations continue to influence the industry, showcasing his commitment to enhancing semiconductor fabrication methods.