Chan-Keun Jung

Title: Innovations in Semiconductor Technology by Chan-Keun Jung

Introduction

Chan-Keun Jung, based in Gyeonggi-do, South Korea, is an accomplished inventor renowned for his contributions to the field of semiconductor technology. With a total of one patent to his name, Jung has developed innovative solutions that enhance the fabrication processes of semiconductor devices.

Latest Patents

Jung's notable patent is titled "Etching composition and method for fabricating semiconductor device using the same." This invention presents a unique etching composition that includes a silyl phosphate compound, phosphoric acid, and deionized water. The method introduced by Jung demonstrates a high etching selectivity for nitride films in comparison to oxide films. This capability allows for precise control over the effective field oxide height (EEH) by managing the etch rate of the oxide film. Importantly, Jung's composition minimizes damage to the oxide film, preventing degradation in electrical characteristics and controlling particle generation, all of which contribute to stable and reliable etching processes.

Career Highlights

Throughout his professional journey, Chan-Keun Jung has made significant contributions while working with prominent companies in the semiconductor industry, including SK Hynix Inc. and Soulbrain Co., Ltd. His expertise and innovative approach have positioned him as a key player in advancing semiconductor technology.

Collaborations

In addition to his individual achievements, Jung has collaborated with notable coworkers, including Sung-Hyuk Cho and Kwon Hong. These partnerships have fostered advancements in their respective fields and contributed to the evolution of semiconductor fabrication methods.

Conclusion

Chan-Keun Jung's innovative endeavors in semiconductor technology exemplify the vital role of inventors in shaping the future of this industry. With his patent for an advanced etching composition, Jung has not only addressed existing challenges in the fabrication process but has also laid the groundwork for further research and development in semiconductor devices. His contributions continue to inspire the next generation of inventors in the field.