Pohang, South Korea

Chan Eon Park


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Pohang-shi, KR (2002)
  • Pohang, KR (2002 - 2005)

Company Filing History:


Years Active: 2002-2005

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4 patents (USPTO):Explore Patents

Title: Innovations of Chan Eon Park

Introduction

Chan Eon Park is a notable inventor based in Pohang, South Korea. He has made significant contributions to the field of materials science, particularly in the development of composite materials and semiconductor devices. With a total of 4 patents to his name, his work has garnered attention in both academic and industrial circles.

Latest Patents

Among his latest patents is a low dielectric constant composite material containing nano magnetic particles. This innovative composite includes nano magnetic particles embedded in a dielectric matrix. The matrix can be composed of inorganic materials such as silica, alumina, or hydrosilsesquioxane, or organic materials like polyimide, polymethyl methacrylate, or methyl silsesquioxane. The nano magnetic particles utilized in this composite consist of various compounds, including FeO, chromium oxide, europium oxide, NiZn-ferrite, MnZn-ferrite, yttrium-iron garnet, or indium. Another significant patent involves a water-soluble polymeric adhesion promoter and its production method, showcasing his expertise in advanced materials.

Career Highlights

Chan Eon Park has had a distinguished career, working with prominent organizations such as Samsung Electronics Co., Ltd. and the Pohang University of Science and Technology Foundation. His experience in these institutions has allowed him to push the boundaries of innovation in his field.

Collaborations

Throughout his career, Chan Eon Park has collaborated with various professionals, including Sang Min Song and Jin Ho Kang. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Chan Eon Park's contributions to materials science and his innovative patents reflect his dedication to advancing technology. His work continues to influence the development of new materials and devices, showcasing the importance of innovation in today's world.

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