Company Filing History:
Years Active: 2019-2025
Title: Chae Eun Lee: Innovator in Display Technology and Fabric Engineering
Introduction
Chae Eun Lee is a prominent inventor based in Gwangju-si, South Korea. He has made significant contributions to the fields of display technology and fabric engineering, holding a total of three patents. His innovative work reflects a deep understanding of materials and design, pushing the boundaries of current technology.
Latest Patents
One of Chae Eun Lee's latest patents is a display device that includes a display panel, a metal plate, and a filling member. These components are arranged on the lower surface of the display panel and consist of different materials. The design also incorporates a fingerprint sensor that is strategically placed beneath the filling member. The metal plate features multiple outlines extending in various directions, with a unique open part that enhances the device's functionality.
Another notable patent involves a fabric containing gas, which is designed with a weave between warps and wefts. Each warp consists of an elongate array of individual gas cells that are physically connected. This innovative fabric design allows for the integration of gas within the cells, showcasing Chae Eun Lee's creativity in material science.
Career Highlights
Chae Eun Lee has worked with notable companies, including Samsung Display Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking projects in display technology.
Collaborations
Throughout his career, Chae Eun Lee has collaborated with talented individuals such as Sang Geun Lee and Ji Ah Lee. These partnerships have fostered a creative environment that has led to the development of innovative solutions in his field.
Conclusion
Chae Eun Lee is a distinguished inventor whose work in display technology and fabric engineering has garnered attention in the industry. His patents reflect a commitment to innovation and a passion for advancing technology. His contributions will undoubtedly influence future developments in these fields.