Catherine Euvrard

Title: Catherine Euvrard: Innovator in Chemical Mechanical Polishing

Introduction

Catherine Euvrard is a notable inventor based in Saint Martin d'Heres, France. She has made significant contributions to the field of microelectronics, particularly through her innovative patent in chemical mechanical polishing processes.

Latest Patents

Catherine holds a patent for a chemical mechanical polishing process for layers of semiconductor materials. This process is applicable to materials such as polycrystalline silicon, epitaxial single-crystal silicon, and amorphous silicon. The patent describes a method where an abrasion of the semiconductor or isolating material is achieved by rubbing the layer with a fabric impregnated with an abrasive composition. The abrasive consists of an aqueous suspension with a neutral pH or a pH close to neutrality, containing individualized colloidal silica particles and water as the suspension medium. This innovation is crucial for the microelectronics semiconductors industry.

Career Highlights

Throughout her career, Catherine has worked with prominent companies, including Clariant and AZ Electronic Materials USA Corp. Her experience in these organizations has allowed her to refine her expertise in semiconductor materials and polishing processes.

Collaborations

Catherine has collaborated with notable professionals in her field, including Eric Jacquinot and Maurice Rivoire. These collaborations have contributed to her success and the advancement of her innovative work.

Conclusion

Catherine Euvrard is a pioneering inventor whose work in chemical mechanical polishing has made a significant impact on the microelectronics industry. Her contributions continue to influence the development of semiconductor technologies.